Electronic and semiconductor gases are specialized for microelectronic manufacturing or semiconductor processing applications such as thin film deposition - including both chemical vapor deposition (CVD) and physical vapor deposition (PVD) - etching, RTP, packaging, or soldering. Electronic and semiconductor gases includes pure gases and gas mixtures configured for specific purposes, including crystal growth, wafer fabrication, oxidation, thermal diffusion, and ion implantation.
Electronic and semiconductor gases for semiconductor manufacturing include ammonia, argon, helium, hydrogen, oxygen, and a wide variety of other high-purity gases based on halocarbon compounds. Electronic and semiconductor gases may also be combined for specific use. For example, a halocarbon pure gas may be combined with oxygen to etch polysilicon or silicon dioxide, or can be combined with another halocarbon to clean wafers and chambers. Electronic and semiconductor gases include high-grade gases used to reduce impurities in sputtering depositions.
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