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Keep current on the latest products, new suppliers, and technical articles of interest to you. (See Topics) |
CERBEC ® ceramic balls are used in hybrid bearings for a wide variety of applications.
CERBEC Balls are made from two types of silicon nitrides made by Saint-Gobain Ceramics: NBD200 and SN101C. They are both fabricated using glass encapsulation HIPing which assures 100% density, high beta phase content,micron-sized grains, and minimal levels of glass phase (read more)
Industrial ceramic materials are non-metallic, inorganic compounds that include oxides, carbides, or nitrides. They have high melting points, low wear resistance, and a wide range of electrical properties. Search by Specification | Learn More about Industrial Ceramic Materials
...swell, soften, nor disintegrate when immersed in water. Silica gel is a matrix of hydrated silicon dioxide used with adsorption equipment. Silica, or silicon dioxide (SiO2), is the same material found in quartz. The gel form contains millions... Search by Specification | Learn More about Adsorption Equipment
Oxide ceramics include alumina, zirconia, silica, aluminum silicate, magnesia and other metal oxide based materials. Search by Specification | Learn More about Oxide Ceramics
Carbon dioxide (CO2) lasers use the energy-state transitions between vibrational and rotational states of CO2 molecules to emit at long IR, about 10 µm, wavelengths. These lasers can maintain continuous and very high levels Search by Specification | Learn More about Carbon Dioxide (CO2) Lasers
Ceramic powders and precursors contain oxides, carbides, nitrides, carbon, and other non-metals. They are usually micron or mesh-size in distribution. Ceramic powders, sol-gel solutions and precursors are fabricated through atomization, crushing, milling, precipitation, and other chemical processes. Search by Specification | Learn More about Ceramic Powders and Precursors
...for refractories and high temperature insulation also include porcelain, silicate, silicon carbide, zirconia, and zirconia. Specialized and proprietary materials include yttria, Hafnia, ceria, and other rare earth oxide (REO) ceramics... Search by Specification | Learn More about Refractories and High Temperature Insulation
...microelectronic devices and optoelectronic devices such as transistors, photodetectors and solar cells. Silicon (Si) is the most commonly used semiconductor material today; however, other semiconductor material types are also available. The number of valence... Learn More about Semiconductors and Semiconductor Materials
Silicon controlled rectifiers (SCR) are four-layer (PNPN) thyristors with three terminals: an input control terminal (gate), an output terminal (anode), and a terminal common to both the input and output (cathode). SCRs are used mainly with high Search by Specification | Learn More about Silicon Controlled Rectifiers (SCR)
...a halocarbon pure gas may be combined with oxygen to etch polysilicon or silicon dioxide, or can be combined with another halocarbon to clean wafers and chambers. Electronic and semiconductor gases include high-grade gases used to reduce impurities... Learn More about Electronic and Semiconductor Gases
...dioxide, carbon monoxide, chlorine, chlorine dioxide, Diborane, dust, fluorine, germane, halocarbons or refrigerants, hydrocarbons, hydrogen, hydrogen chloride, hydrogen cyanide, hydrogen fluoride, hydrogen selenide, hydrogen sulfide, mercury vapor... Search by Specification | Learn More about Gas Detectors and Gas Sensors
Neutral density filters are designed to reduce transmission evenly across a portion of the spectrum. They are slightly sensitive to angles but they are much more forgiving than interference filters. Search by Specification | Learn More about Neutral Density Filters
Ceramic abrasives and media include aluminum oxide, boron carbide, cubic boron nitride (CBN), cerium oxide, fabricated diamond, silicate, silicon carbide, tin oxide, tungsten carbide, zirconia, and other fused or sintered crystalline inorganic Search by Specification | Learn More about Ceramic Media and Abrasives
...of wastewater. The most common industrial gases are oxygen, hydrogen, nitrogen, carbon dioxide, and rare gases such as argon, neon, xenon, and krypton. Rare industrial gases such as argon are commonly used in laser applications. Some industrial gases are highly... Search by Specification | Learn More about Industrial Gases
...wafers are rapidly oxidized to form a silicon dioxide dielectric layer by a brief exposure to high temperature steam. Vacuum annealing is an extended thermal processing using a longer cycle or process time for oxidation; wafer annealing, head... Search by Specification | Learn More about Thin Film Equipment
Supercritical Fluid Extraction Systems use carbon dioxide or water in a supercritical fluid state to dissolve and extract materials. Learn More about Supercritical Fluid Extraction Systems
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Electrical Engineering Ceramic Components Friatec N.A., LLC
FRIALIT - DEGUSSIT Engineered Oxide Ceramics Friatec N.A., LLC
Mechanical Engineering Ceramic Components Friatec N.A., LLC
Surface Processing Ceramic Materials Friatec N.A., LLC
SN-101C Silicon Nitride Ceramic Bearing Balls Saint-Gobain Ceramics - Cerbec
NBD-200 Silicon Nitride Ceramic Bearing Balls Saint-Gobain Ceramics - Cerbec
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Silicon Oxide Nanoparticle (SiO2, 99.8%, 10-20nm, surface modified with single layer organic chain, dispersible, highly hydrophobic) (read more)
Rogue Valley Microdevices offers Dry Thermal Oxide. Our ultra pure Dry Oxidation process is available for those applications requiring thinner oxides. We offer Chlorinated and Non-Clorinated Dry Thermal Oxide. Using Dry Chlorinated Thermal Oxide can help your devices perform to their highest potential by eliminating metal ions. (read more)
Rogue Valley Microdevices is pleased to offer PECVD Silicon Carbide. This highly durable thin film can be deposited alone or within stack of PECVD Oxide and/or Nitride films. PECVD Silicon Carbide is the perfect choice for use as a hard mask for bulk micromachining. Rogue Valley Microdevices process all wafers and films in-house at our Medford, Oregon facility. (read more)
Rogue Valley Microdevices offers PECVD Silicon Carbide, which is a single side deposition. This highly durable thin film can be deposited alone or within stack of PECVD Oxide and/or Nitride. PECVD Silicon Carbide is the perfect choice for use as a hard mask for bulk micromachining of your finished wafers. We are able to process wafer diameters of 50mm up to 300mm. (read more)
Rogue Valley Microdevices offers PECVD Silicon Carbide (SiC), which is a single side deposition. This highly durable thin film can be deposited alone or within stack of PECVD Oxide and/or Nitride. PECVD Silicon Carbide is the perfect choice for use as a hard mask for bulk micromachining of your finished wafers. We are able to process wafer diameters of 50mm up to 300mm. (read more)
Optek inline chlorine dioxide analyzers provide a full spectrum of chlorine dioxide concentration measurements inline and real-time. These precise and repeatable measurement ranges include both aqueous and gaseous process streams at PPM and grams per liter levels. (read more)
The Titanium Dioxide Micronizer® is a steam powered machine, with no moving parts, used to size reduce (pulverize) Titanium Dioxide to low micron & sub-micron sizes by using particle-on-particle impact. (read more)
Sulfur Dioxide – Filtered for H2S. (0 – 10.0 ppm). Part No. 823-0218-22 (read more)
Chlorine Dioxide. Filtered for Cl2 and H2S. (0 – 1.00 ppm). Part No. 823-0239-21 (read more)
The GM70 Meter, with optional sample pump, measures carbon dioxide accurately for measurement ranges between 0...2000 ppm and 0...20% CO2. GM70 is ideal for spot-checking applications, like laboratories, greenhouses, mushroom farms and HVAC applications. It can be used as a calibration check instrument for Vaisala's GM20 and GM220 Series fixed carbon dioxide instruments. (read more)
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High-k and Metal Gate Research has led the industry in transistor gate dielectric scaling using silicon dioxide (SiO2) for seven logic-process generations over the last 15 years. See Intel Corporation Information |
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MOSFET - Wikipedia, the free encyclopedia growing a layer of silicon dioxide (SiO2) on top of a silicon substrate and depositing a layer of metal or polycrystalline silicon (the latter is |
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Silicon carbide - Wikipedia, the free encyclopedia Silicon carbide From Wikipedia, the free encyclopedia |
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Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for... Reactive Ion Etching of PECVD Silicon Dioxide (SiO2) Layer for MEMS application See Storming Media LLC Information |
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Silicon Silicon Element Facts 14 Si 28.0855 Silicon |
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Silicon dioxide (SiO2),Wholesale China Silicon dioxide (SiO2)... Silicon dioxide (SiO2),Wholesale Silicon dioxide (SiO2) China,Suppliers, Distributor Silicon dioxide (SiO2) |
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XPSstdData Effects of Elastic-Electron Scattering on Measurements of Silicon Dioxide Film Thicknesses by X-ray Photoelectron Spectroscopy |
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Semiconductors: Silicon: Device Fabrication: Deposition: Major... Silicon Dioxide (SiO2) SiH4 + 4 CO2 ?> SiO2 + 4 CO + 2 H2O N2 carrier gas (500-900°C) See Occupational Safety & Health Administration (OSHA) Information |
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IBM Technical Journals Electrochemical Phenomena in Thin Films of Silicon Dioxide on Silicon Related Subjects: Films, oxide; Films, thin; Silicon; Silicon dioxide |
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IBM Technical Journals Electrochemical Phenomena in Thin Films of Silicon Dioxide on Silicon Growth and characterization of ultrathin nitrided silicon oxide films |